Against the backdrop of increasingly stringent “zero-defect” requirements in semiconductor manufacturing, the Lijie 9-inch low-chlorine nitrile gloves have become indispensable protective equipment in wafer processing and chip packaging stages due to their exceptional low ionic residue and high cleanliness performance. Through specialized processing, the glove’s chlorine content is strictly controlled at ≤50ppm—significantly surpassing the industry standard of 100ppm. This effectively prevents corrosion risks caused by chloride ion migration on wafer surfaces, meeting semiconductor manufacturing’s stringent requirements for microscopic contamination control.
During lithography processes, glove cleanliness directly impacts photoresist coating precision and exposure outcomes. Manufactured in Class 100,000 cleanrooms and subjected to laser dust removal, this product exhibits surface particle emission below 0.2 particles/square inch—meeting ISO Class 3 cleanroom standards. This effectively prevents micro-particle adhesion to wafer surfaces, thereby reducing lithography defects. The 9-inch length design provides full coverage from wrist to palm. Combined with an elastic cuff structure, it ensures operational flexibility while effectively preventing dust shedding at the sleeve opening, meeting the stringent requirements for dynamic clean environments in lithography processes.
During processes involving highly corrosive reagents such as etching and ion implantation, these gloves demonstrate exceptional chemical resistance. After 24-hour immersion testing in common semiconductor reagents like hydrofluoric acid and phosphoric acid, they exhibit no swelling or cracking, with a weight change rate below 0.8%. This provides reliable hand protection for operators while eliminating reagent contamination risks from glove damage. The fingertips feature 0.02mm laser-engraved anti-slip textures, increasing friction by 35% when handling 12-inch wafers and reducing the risk of wafer slippage by 60%. This achieves a balance between protective safety and operational stability.
Currently certified to SEMI F57 standards, these gloves are deployed in mass production lines at leading foundries including SMIC and Hua Hong Semiconductor. They reduce wafer scrap rates caused by hand contact by 38%, establishing themselves as the ideal choice in semiconductor manufacturing for balancing cleanroom protection with operational efficiency.
Post time: Nov-11-2025